Maryland's Defense Patent Database

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Solvent-free, self-polishing polyurethane matrix for use in solvent-free antifoulings

Patent image
NRL

A polyol having the formula Si(O—R1—OH)m(O—R2)nR3. Each R1 is a divalent radical derived from diethylene glycol, triethylene glycol, dipropylene glycol, or tripropylene glycol, each R2 is an aliphatic group, and R3 is an alkyl group or aromatic group. The value m is 2 or 3 and n is 0 or 1. A process of making the above polyol by: providing a reactant having the formula Si(O—R2)3R3, and reacting the reactant with a diol having the formula HO—R1—OH. An antifouling coating comprising a thermoset formed by reacting a polyisocyanate with the above polyol. The coating is not a foam.

Inventors: 
Verborgt, Jozef; Webb, Arthur A.
Patent Number: 
Technical domain: 
Materials and Coatings
FIle Date: 
2015-10-20
Grant Date: 
2016-08-02
Grant time: 
287 days
Grant time percentile rank: 
5
Claim count percentile rank: 
3
Citations percentile rank: 
1
'Cited by' percentile rank: 
1
Assignee: 
US NAVY